硅酸盐学报

退火处理对玻璃表面沉积的ZnO薄膜微观形貌与性能的影响

作者：阮鑫栋姜妍彦杜兴科刘贵山胡志强刘敬肖

分类号：TQ171.7

出版年,卷(期):页码：2013,41(6):820-824

DOI：

摘要：

以Zn(NO₃)₂·6H₂O为前驱体，采用超声喷雾热解法在500℃下、在钠钙硅浮法玻璃衬底上制备了ZnO薄膜。分别在不同温度(500、550、600℃)和不同时间(30、60、120min)对制备的ZnO薄膜进行了退火处理。研究退火条件对ZnO薄膜微观结构、形貌以及光学性能的影响。结果表明：退火处理能提高ZnO薄膜的c轴取向；随着退火时间的延长，ZnO薄膜附着强度随之增加，但c轴取向度呈先增强，至120min时又开始呈下降的趋势；随着退火温度的升高，ZnO薄膜的c轴取向亦出现先显著增强，之后又开始下降的趋势，同时可见光透过率亦呈相同的变化趋势。最佳退火条件为500℃温度保温60min，此时薄膜不仅c轴取向生长优势明显，结晶质量良好，表面颗粒大小均匀，致密平滑，同时薄膜的可见光透过率由退火前的70%提高到90%。

ZnO thin films were prepared by a ultrasonic spray pyrolysis (USP) method on soda-lime-silica float glass substrate at the deposition temperature of 500℃ with zinc nitrate as a precursor. The ZnO thin films were annealed at different temperatures (500, 550, 600℃) and durations (30, 60, 120min), respectively. Influence of annealing condition on the microstructure, morphology and optical properties of the films was investigated. The results indicate that the annealing treatment improves the quality of the ZnO film and increases the c-axis orientation. The adhesion strength of the ZnO film increases with the extension of the annealing duration, however, the c-axis orientation degree first increases and then decreases at 120min. The c-axis orientation and the visible light transmittance firstly increase and then decrease with the increase of annealing temperature. The film obtained at the optimum annealing temperature of 500℃and the duration of 60min has a good crystallization quality, uniform crystal size and dense smooth surface, giving the improved optical properties. The visible light transmittance increases from 70% to 90% after annealing treatment.

基金项目：

作者简介：

第一作者：阮鑫栋(1986—)，男，硕士。通信作者：姜妍彦(1960—)，女，博士，教授。

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